A workshop on aberration-corrected electron microscopy, sponsored by Carl Zeiss SMT, was held at
the Center for Nanoscale Systems (CNS) at Harvard University in Cambridge, MA, USA, on January 20-21,
2010. The workshop attendance was unexpectedly high. Organizers had to move the roughly 100 attendees to a much larger lecture hall than originally planned.
Prof. Frans Spaepen, Interim Director of the CNS said: “The workshop on aberration-corrected electron microscopy at CNS was a great success. It was the culmination point of our collaboration with Carl Zeiss to bring electron microscopy at Harvard to the leading edge. The workshop featured highly instructive and forward-looking talks by the foremost experts in aberration correction, including several from Carl Zeiss, as
well as hands-on demonstrations the next day. I was very pleased with the interest from both inside and outside Harvard, and I thank the scientists, engineers and managers at Carl Zeiss for helping to make this possible.”
On the first day, internationally renowned experts in the field gave lectures on the background, theory,
implementation and applications of aberration correction in TEM and STEM. The speakers were: David Bell, Harvard University: ‘What aberration correction electron microscopy means for Harvard’; Max Haider, CEOS: ‘Development of correctors to fulfill the needs for advanced instruments’; Gerd Benner, Carl Zeiss: ‘Aberration corrected phase contrast microscope – the key to true TEM images’; Yimei Zhu, BNL: ‘Atomic imaging of surface and bulk using aberration corrected electron microscopes’; Arno Merkle, Carl
Zeiss: ‘Electron microscopy in North America’; Christian Kisielowski, LBNL: ‘Can we observe atoms at work?’; Douglas Blom, USC: ‘Aberration-corrected electron microscopy for materials characterization’;
Stephan Irsen, Bonn: Cs correction in routine work’; Simone Pokrat, Carl Zeiss: ‘Concepts of EELS
and the benefit of a monochromator’; and Bernd Kabius, ANL: ‘Benefits of aberration corrected TEM for material science problems’.
The second day focused on seminars, discussion meetings and student tutorials on the two newly installed Zeiss Libra 200 monochromated aberration-corrected electron microscopes at the
Center for Nanoscale Systems.
