Raith ELPHY MultiBeam teaches FIB-SEM instruments professional nanofabrication
Analytical FIB-SEM microscopes have become a popular multiple-application research tool. To extend these microscopes for maximum nanopatterning performance, you can now upgrade them with the ELPHY MultiBeam from Raith. Unlike earlier solutions of pattern generators, the ELPHY MultiBeam is now optimized for both, high end electron and ion beam nanofabrication techniques, which are
· Focused ion beam milling, etching and deposition
· Ion beam lithography (IBL)
· Electron beam lithography (EBL)
· Gas-assisted focused electron beam-induced processing (FEBIP)
· Helium ion beam patterning
It delivers true lithographic performance on an analytical FIB-SEM microscopes by combining the newest evolution in multi-technique nanofabrication and 3D ion beam lithography (IBL) with the best electron beam lithography (EBL) performance available for upgrades.
