Massachusetts Institute of Technology, Hewlett Packard, and EMPA chose Raith ELPHY MultiBeam: Enables multi-technique helium ion microscope-based nanopatterning research
The Massachusetts Institute of Technology (MIT), Hewlett Packard (HP), and the Swiss Federal Laboratories for Material Science and Technology (EMPA) in Dübendorf, Switzerland, have selected the ELPHY MultiBeam, the latest generation of Raith pattern generator kits for nanofabrication, for their Carl Zeiss SMT ORION helium ion microscopes (HIM).
When equipped with the former ELPHY Plus nanolithography attachment, the HIM has already shown promise for high resolution ion beam lithography [Paul Alkemade, Diederik Maas, et. al., Microscopy and Analysis, November 2010, p. 5]. Raith recently introduced the ELPHY MultiBeam nanofabrication kit with the aim of unlocking the full nanofabrication potential of HIM, FIB and FIB/SEM microscopes for the rapidly growing ion beam lithography and multi-application community.
“With ELPHY MultiBeam´s capabilities being optimized for techniques with both electrons and ions, researchers can now access an even broader range of nanofabrication applications with their microscopes” says Frank Nouvertné, senior product manager of Raith. “Whether used for electron/ion beam lithography, milling or material deposition/etching tasks, they all benefit from the well established professional ELPHY lithography platform”.
“We have chosen the Raith ELPHY MultiBeam as being a real lithography system able to handle complex patterns and overlay jobs using dedicated alignment capabilities. Moreover, many unique features, such as professional GDSII editor based patterning on image and flexible directional patterning modes, are of very high importance in ion-milling applications. We believe that Zeiss Orion in combination with Raith ELPHY MultiBeam will have an immediate impact on our activities in the fields of photonics and electronics“ said Konstantins Jefimovs, senior researcher at EMPA.
Having already had a long history with Raith, Professor Karl Berggren of the Department of Electrical Engineering and Computer Science at MIT ultimately selected the ELPHY MultiBeam, and Karl and his research community will have the full support of the Raith company in their HIM-based nanofabrication applications.
