Paul Alkemade,1 Vadim Sidorkin,1 Ping Chen,1 Emile van der Drift,1 Anja van Langen,1 Diederik Maas,2 Emile van Veldhoven,2 and Larry Scipioni 3 1. Kavli Institute of Nanoscience, Delft University of Technology, Delft, The Netherlands. 2. TNO Science and Industry, Delft, The Netherlands. 3. Carl Zeiss NTS, Peabody, MA, USA.
The helium ion microscope (HIM) opens a new frontier in microscopy. Even more, the atomic-size ion source of the HIM hints at nanofabrication on the atomic scale. Recent experiments of helium ion beam lithography and helium ion beam induced deposition have indeed shown that nanofabrication with helium ions is feasible. Moreover, in some important aspects, such as spatial resolution and achievable pattern densities, the focused helium beam surpasses the established nanofabrication techniques. In this article we discuss two examples where the helium ion microscope shows the ability to write small, dense patterns that will be enablers for advanced nanofabrication applications, using direct-write lithography and beam-induced chemistry.