Rainer Reiche, Rainer Kaesmaier, Rüdiger Rosenkranz, Uwe Ritter, Steffen Teichert and Susann Leinert, Qimonda Dresden, Physical Failure Analysis Department, Dresden, Germany We have investigated the applications of helium-ion microscopy for imaging and material analysis in semiconductor manufacturing, as well as for typical failure analysis tasks. HIM image resolution and contrast generation were compared with state-of-the-art SEM
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Kashma K. Rai, Sameet K. Shriyan and Adam K. Fontecchio, Electrical and Computer Engineering Department, Drexel University, Philadelphia, PA, USA
Fundamental research on the interaction of light with materials such as liquid crystals and polymers has led to innovative applications such as the omnipresent LCDs. Here we briefly review traditional techniques used for the analysis of holographic polymer dispersed liquid crystals and discuss new techniques
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Petra Bele, Department of Physics, Technical University Munich, Garching, Germany
An almost ideal DQE for a wide range of electron doses is achieved in TEM imaging plates by a new approach to correct the characteristic noise of IP. The new data processing consists of a combination of a noise correction step and a geometric distortion corrected gain normalization
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Syed Nasimul Alam, National Institute of Technology-Rourkela, Rourkela, Orissa, India
This study aimed to track the growth of the tungsten grains in tungsten filaments of incandescent lamps working under different conditions. Different tungsten lamp filaments from a 100 watt incandescent lamp, both fresh and failed after complete usage of life period, a 15 watt refrigerator pygmy lamp and a 100 watt lamp used for 12 hours only were studied using an SEM
FULL ABSTRACT AND DOWNLOADABLE PDF NOT YET AVAILABLE: Registered readers of Microscopy and Analysis may download PDFs of all articles and tutorials when they become available (typically 6-12 months after publication in the print version). We will notify you when this article will be available for download.