Pella launches silicon nitride TEM support films
25-Mar-08
Image: 50 nm membrane with 0.5 x 0.5 mm window with ALD modified surface
Ted Pella, Inc. of Redding, CA, has announced a new addition to their successful second generation silicon nitride support films for TEM.
Based on the widely used 50 nm thin Si3N4 membrane with a 0.5 x 0.5 mm window, commercially available versions with either a hydrophobic or a hydrophilic surface are now offered. The 50 nm membranes have been ALD (atomic layer-deposited) modified to create surfaces with these unique properties. The hydrophilic coating offers enhanced wetting and biocompatibility for life science reserach, where as the hydrophobic coating offers a novel platform for deposition and growth of nanomaterials.
The coated 50 nm membranes are available with low, medium and high surface energies ranging from 24.6 to 76.1 mJ/m2. The surfaces are modified by well-defined technologies creating extremely smooth conformal surfaces (typical roughness Ra 0.45 nm or better).
By making these desirable nanotech products commercially available, Ted Pella enables scientists to use off shelf-modified surfaces enabling faster research results.
For more information visit www.tedpella.com or sales@tedpella.com
- Author:
- Julian Heath
- Publisher:
- Microscopy and Analysis
- Date:
- 25-Mar-08
- Categories:
- B11: EM Accessories
- Sections:
- News
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