EMAG 2009, Sheffield, UK 8-11 September 2009

Electron microscopy is currently in a period of rapid technological development, with advances such as aberration correctors, monochromators, developments in focused ion-beam instruments, and new detector technologies opening many new research avenues. Alongside these come developments in existing techniques and the invention of new techniques. All these advances are broadening the range of electron microscope application at a time when the ever shrinking dimensions of new technologies require it. The Electron Microscopy and Analysis Group’s (EMAG) biennial conference has established a strong reputation as a key event in the calendars of the national and international microscopy communities, since its inaugural meeting in 1946 (then known as the Electron Microscopy Group). It has always sought to capture the latest in the development and applications of electron microscope techniques. EMAG 2009 will continue this tradition in Sheffield, a city well known for materials development. The central location of Sheffield means that EMAG 2009 will be easily accessible for day visitors as well as for delegates attending the whole conference and the advanced school. A high quality Trade Exhibition is at the heart of an EMAG conference and EMAG 2009 will build on the success of the Exhibition at Glasgow in 2007 with a mixture of exhibits and technical workshops to enable delegates to interact with vendors and witness the latest developments in microscopy and nanotechnology. A one-day advanced school on the subject of Nanofabrication and Nanomanipulation will be held on Tuesday 8 September to enable young researchers to expand their knowledge in a key subject theme of the conference.